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Cover of Plasma Processes for Semiconductor Fabrication

Plasma Processes for Semiconductor Fabrication

by W. Nicholas G. Hitchon, Haroon Ahmad, Michael Pepper

Cambridge University Press · 1999

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About this book

Published by Cambridge University Press in 1999, Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, Haroon Ahmad & others runs to 221 pages. It belongs to the Cambridge studies in semiconductor physics and microelectronic engineering series.

The book deals with Semiconductors, Etching, Plasma etching and Plasma (ionized gases).

Book details

ISBN-13
9780521591751
ISBN-10
0521591759
Authors
W. Nicholas G. Hitchon, Haroon Ahmad, Michael Pepper
Published
1999
Series
Cambridge studies in semiconductor physics and microelectronic engineering
Pages
221
Language
English
Condition
New

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