Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Name: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Brand: Springer Verlag, Singapore
SKU: 9789811500459
Price: 7774.00 INR
Availability: InStock

by Guilei Wang

Springer Verlag, Singapore · 2019 · Hardcover

₹7,774

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About this book

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond by Guilei Wang is an 115-page hardcover edition published by Springer Verlag, Singapore in 2019.