Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Published by William Andrew Publishing in 1992, Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by John E.It belongs to the Materials science and process technology series series.

Its main subjects are Integrated circuits, Materials, Tungsten and Ultra large scale integration.